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SYNOPSYS AND UMC PARTNER
ON LOW POWER 90-NM REFERENCE DESIGN FLOW TO DELIVER FASTER TIME
TO SOC SUCCESS
Reference Design Flow
Features Low Power Management and Design-for-Manufacturing Automation
Capabilities
MOUNTAIN VIEW, Calif. and HSINCHU Taiwan, -November 21, 2005-
Synopsys, Inc. (Nasdaq:SNPS), a world leader in semiconductor design
software, and UMC (NYSE: UMC; TSE: 2303), today announced the availability
of a 90-nanometer (nm) reference design flow that is optimized for
low-power system-on-chip (SoC) designs. The validated RTL-to-GDSII
design flow is based on Synopsys' GalaxyTM Design Platform,
ARM Artisan
SAGE-XTM standard cell library, and UMC's 90-nm process.
It addresses leakage power challenges at 90 nm and provides advanced
design-for-manufacturing (DFM) capabilities for faster yield ramp
and lower development costs.
"At UMC, we recognize the importance of working with leading
EDA companies such as Synopsys to deliver silicon-validated reference
design flows that address the SoC design challenges encountered
at nanometer technologies," said Ken Liou, director of the
IP and Design Support Division at UMC. "This latest development
with Synopsys is specifically designed to give customers the benefit
of both companies' expertise to help them achieve first pass silicon
success with reduced time and risk."
The reference design flow incorporates many of Synopsys' Galaxy
Design Platform's low power and design-for-manufacturing innovations,
including Power Network Synthesis (PNS) and Power Network Analysis
(PNA) products, which are used to design power plans at the floorplanning
stage. Other floorplanning capabilities include virtual flat floorplanning
with physical hierarchy-aware global routing, virtual timing optimization,
and macro placement with automatic hierarchy detection. Designers
can create an optimized initial design floor plan using these advanced
features to guide them to the next design steps in physical synthesis
and place and route. By following this plan, designers can achieve
faster timing closure and avoid design iterations. The reference
design flow also features multi-threshold (MVth) optimization to
take advantage of the available UMC 90-nm multi-threshold libraries
for leakage power reduction. In addition, the flow supports advanced
signal integrity capabilities to perform analyses for electro migration
(EM) and voltage drop (IR) that are crucial in avoiding design failure
in 90-nm and below designs.
"Our close relationship with UMC helps ensure that the reference
flow will satisfy the demands of even the most advanced designers
dealing with 90-nanometer process design issues in power optimization
and design for manufacturing and yield," said Rich Goldman,
vice president of Strategic Market Development at Synopsys. "This
collaboration builds upon UMC's advanced technology and Synopsys'
Professional Services proven expertise to give designers access
to an optimized path to silicon that delivers higher quality of
results while speeding time to results."
Synopsys has brought several new DFM capabilities to the new 90-nm
reference design flow. One example is the addition of timing-driven
dummy metal insertion to specifically meet UMC's metal density requirements
while maintaining timing closure, and automatic redundant via and
via farm insertion. These new DFM capabilities can help designers
improve reliability and are supported in Synopsys' place-and-route
solution.
Availability
The UMC/Synopsys reference design flow is available now and can
be accessed from UMC's website at http://www.umc.com.
About UMC
UMC (NYSE: UMC, TSE: 2303) is a leading global semiconductor foundry
that manufactures advanced process ICs for applications spanning
every major sector of the semiconductor industry. UMC delivers cutting-edge
foundry technologies that enable sophisticated system-on-chip (SoC)
designs, including 90nm copper, 0.13um copper, and mixed signal/RFCMOS.
UMC is also a leader in 300mm manufacturing; Fab 12A in Taiwan and
Singapore-based Fab 12i are both in volume production for a variety
of customer products. UMC employs approximately 10,500 people worldwide
and has offices in Taiwan, Japan, Singapore, Europe, and the United
States. UMC can be found on the web at http://www.umc.com.
About Synopsys
Synopsys, Inc. is a world leader in EDA software for semiconductor
design. The company delivers technology-leading semiconductor design
and verification platforms and IC manufacturing software products
to the global electronics market, enabling the development and production
of complex systems-on-chips (SoCs). Synopsys also provides intellectual
property and design services to simplify the design process and
accelerate time-to-market for its customers. Synopsys is headquartered
in Mountain View, California and has offices in more than 60 locations
throughout North America, Europe, Japan and Asia. Visit Synopsys
online at http://www.synopsys.com.
Synopsys is a registered trademark of Synopsys,
Inc. Galaxy is a trademark of Synopsys. All other trademarks or
registered trademarks mentioned in this release are the intellectual
property of their respective owners.
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