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UMC
EXTENDS RANGE OF 1T-SRAM® MEMORY MACROS
Adds MoSys' 1T-SRAM embedded memory for
0.15- and 0.13-micron standard logic processes
HSINCHU,
TAIWAN and SUNNYVALE, CALIFORNIA (Sep. 24 , 2001)
-UMC (NYSE:UMC) and MoSys (NASDAQ: MOSY) announced they have
extended their cooperation to offer ultra-high density 1T-SRAM memories
to UMC's foundry customers, by porting MoSys' 1T-SRAM memory technology
to UMC's 0.15- and 0.13-micron standard logic processes. This builds
on the earlier successful porting and silicon verification of MoSys'
1T-SRAM memory to UMC's 0.18-micron standard logic process.
"As customers demand increased density for embedded memory,
MoSys is committed to ensuring that 1T-SRAM memory is available
on the latest processes to facilitate the design of their next generation
of products," noted Mark-Eric Jones, vice president and general
manager of intellectual property at MoSys. "We are pleased
to work with UMC to extend the availability of 1T-SRAM macros to
UMC's advanced logic processes."
By using a single transistor bit cell, MoSys' 1T-SRAM memory delivers
embedded memory macros with double the density of traditional SRAM,
while still delivering the fast random access cycle performance
required by today's System-on-Chip (SoC) designs. The use of the
standard logic process permits designers to economically embed large
quantities of memory in the process that is optimum for the logic
circuitry of the SoC design.
"We are pleased to extend our relationship with MoSys in order
to offer our customers cost-effective solutions for embedded memory,"
commented Jean Tien, strategic marketing vice president of UMC.
"The combination of UMC's advanced logic processes and MoSys'
1T-SRAM technology provides designers with a strong technology platform
for their next generation of SoC products."
ABOUT MOSYS
Founded in 1991, MoSys develops, licenses and markets innovative
memory technology for semiconductors. MoSys' patented 1T-SRAM technology
offers a combination of high density, low power consumption, high
speed and low cost unmatched by other available memory technologies.
The single transistor bit cell used in 1T-SRAM technology results
in the technology achieving much higher density than traditional
four or six transistor SRAMs while using the same standard logic
manufacturing processes. 1T-SRAM technology also offers the familiar,
refresh-free interface and high performance for random address access
cycles associated with traditional SRAMs. In addition, this technology
can reduce operating power consumption by a factor of four compared
with traditional SRAM technology, contributing to making it an ideal
technology for embedding large memories in System on Chip (SoC)
designs. 1T-SRAM technology is in volume production both in SoC
products at MoSys' licensees as well as in MoSys' standalone memories.
MoSys is headquartered at 1020 Stewart Drive, Sunnyvale, California
94085. More information is available on MoSys' website at http://www.mosys.com.
Note for Editors:
1T-SRAM(tm) is a MoSys trademark registered in the U.S. Patent and
Trademark Office. All other trademarks or registered trademarks
are the property of their respective owners.
Editorial Contacts
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Alex Hinnawi
Hsinchu, Taiwan
+ 886 (2) 2700-6999 x6958
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Neville Reid
Sunnyvale, CA
+1 (408) 731-1830
neville.reid@mosys.com
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